Article

Development and Characterization of a Ribbon-Type Ion Beam Source Test Bench for Ion Implantation Applications

2026-01-30

Abstract excerpt

<title>Abstract</title> <p>As semiconductor manufacturing processes become increasingly advanced and diversified, ion implantation processes capable of precisely controlling ion energy and implantation current are increasingly required, leading to growing demand for reliable ion source evaluation testbench. In this study, a ribbon-type ion beam source test bench is designed and constructed to investigate ion beam...

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Literature Corpus work: c843c987-e933-5c53-9987-8552518e9fe8
DOI: 10.21203/rs.3.rs-8477349/v1

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Development and Characterization of a Ribbon-Type Ion Beam Source Test Bench for Ion Implantation ApplicationsDOI 10.21203/rs.3.rs-8477349/v1Read

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